Release of the JXA-8530FPlus, a New Electron Probe Microanalyzer – High Throughput Analysis by the Improved Electron Optical System –2017/01/05
JEOL Ltd. (President Gon-emon Kurihara) announces the release of the JXA-8530FPlus Electron Probe Microanalyzer (EPMA) equipped with the In-Lens Schottky Plus FEG (field emission gun), to be distributed in January 5, 2017.
Product development background
JEOL commercialized the world’s first FE-EPMA, the JXA-8500F in 2003. This highly regarded FE-EPMA has long been used in various fields, such as: metals, materials and geology in both industry and academia.
The JXA-8530FPlus is a third-generation FE-EPMA that comes with enhanced analytical and imaging capabilities, delivered by an improved electron optical system. The In-Lens Schottky FEG combined with new software provides higher throughput. This new cutting-edge FE-EPMA also adopts a highly-expandable multipurpose chamber. Incorporating various functions, the JXA-8530FPlus meets a variety of demands of users while maintaining high stability, thus allowing a wider range of EPMA applications to be achieved with higher resolution.
This analyzer will be offered to university laboratories and public R&D sites
- In-lens Schottky Plus FEG EPMA version
The In-Lens Schottky Plus FEG EPMA version, with an optimized angular current density, allows for analysis with a large probe current of 2 μA or more. The guaranteed resolution of secondary electron image has been improved even under analytical conditions by automatically adjusting for the correct convergence angle.
- Advanced software
A wealth of Microsoft Windows®-based advanced applications systems are available, including: 1) Trace Element Analysis Program for simpler, optimized analysis of trace elements including adding data collected from up to 5 spectrometers, 2) Phase Map Maker for automatic creation of phase maps based on principal components, 3) Non-Flat Surface Analysis Program for automated WDS analysis of specimens with surface irregularities.
Notices:Windows is a registered trademark of Microsoft Corporation in the United States and other countries.
- Flexible WDS configuration
Various X-ray spectrometers (WDSs) can be selected: a Rowland circle radius of 140 mm (140R) or 100 mm (100R), 2 crystal or 4 crystal configurations and a mix of standard or large size crystals. The XCE (2 xtl) X-ray Spectrometer, the FCS (4 xtl) X-ray spectrometer and the L (large 2 xtl) X-ray Spectrometer for 140R have wide spectrometry range and provide superior wavelength resolution and peak-to-background ratio. The H Type X-ray Spectrometer of 100R provides high X-ray intensity. Users can select from these spectrometers depending on requirements.
- Combined WDS/EDS system
The JXA-8530FPlus comes with JEOL’s 30 mm2 silicon-drift detector (SDD). A high count-rate SDD along with an in-situ variable aperture enables EDS analysis at WDS conditions. EDS spectra, maps and line scans can be acquired simultaneously with WDS data.
- Multipurpose chamber
The JXA-8530FPlus is equipped with a highly-expandable specimen chamber and specimen exchange chamber, enabling you to integrate a variety of optional attachments on the chamber.
- Electron Backscatter Diffraction System (EBSD)
- Cathodoluminescence Detectors (panchromatic, monochromatic, full color hyperspectral)
- Soft X-ray Emission Spectrometer
- Air Isolated Transfer Vessel
- High Etching Rate Ion Source
- Powerful clean vacuum system
A powerful, clean vacuum system is employed on the JXA-8530FPlus, including two magnetic-levitation turbo molecular pumps. In addition, a two-stage intermediate chamber is provided for the electron optical column, thus maintaining high vacuum in the electron-gun chamber by differential pumping. The addition of optional Scroll pumps and a liquid nitrogen cold finger creates the ultimate oil free vacuum system.
- Soft X-ray Emission Spectrometer (SXES)
An ultra-high energy-resolution Soft X-ray Emission Spectrometer was co-developed by the Institute of Multidisciplinary Research for Advanced Materials, Tohoku University (Prof. M. Terauchi) and JEOL Ltd., etc.
The variable-line-spacing (VLS) grating enables simultaneous detection (much like EDS) and allows detection of Li-K and B-K spectra with a high-sensitivity CCD. This spectrometer achieves superbly high energy-resolution, enabling detailed chemical-bonding state analysis.
- miXcroscopy (Correlative microscope)
Regions of interest, along with X-Y stage coordinates, located in the optical microscope can be recorded and transferred to the EPMA for navigation to the desired location for imaging and analysis.
|Elemental analysis range||WDS: (Be) B to U, EDS: B to U|
|X-ray spectrometry range||WDS spectrometry range: 0.087 to 9.3 nm
EDS energy range: 20 keV
|Number of X-ray spectrometers||WDS: 1 to 5 selectable, EDS: 1|
|Maximum specimen size||100 mm × 100 mm × 50 mm (H)|
|Accelerating voltage||1 to 30 kV (0.1 kV step)|
|Probe current stability||± 0.3%/h (10 kV, 50 nA)|
|Secondary electron image resolution||3 nm at WD 11 mm, 30 kV|
|20 nm at 10 kV, 10 nA, WD 11 mm
50 nm at 10 kV, 100 nA, WD 11 mm
|Magnification||×40 to ×300,000 (WD 11 mm)|
|Scanning image pixel resolution||Up to 5,120 × 3,840|
Annual unit sales target
35 units/year (initial year)
JEOL is a world leader in electron optical equipment and instrumentation for high-end scientific and industrial research and development. Core product groups include electron microscopes (SEMs and TEMs), instruments for the semiconductor industry (electron beam lithography and a series of defect review and inspection tools), and analytical instruments including mass spectrometers, NMRs and ESRs.
For more information about JEOL Ltd. or any JEOL products, visit www.jeol.com.