Release of the JIB-4700F, a New Multi Beam System (Focused Ion Beam-Scanning Electron Microscope (FIB-SEM)) – High Resolution, High Throughput System for Nano Milling and Analysis –2017/01/05
JEOL Ltd. (President Gon-emon Kurihara) announces the release of the JIB-4700F Multi Beam System, a newly-developed FIB-SEM instrument to be distributed in January 5, 2017.
Product development background
Advances in the development of new materials featuring complex nanostructures places increased demands on FIB-SEM instruments for exceptional resolution, accuracy and throughput. In response, JEOL has developed the JIB-4700F Multi Beam System, a new processing and observation system to be used in morphological observations, elemental and crystallographic analyses of a variety of specimens.
The JIB-4700F features a hybrid conical objective lens, GENTLEBEAM™ (GB mode) and an in-lens detector system to deliver a guaranteed resolution of 1.6 nm at a low accelerating voltage of 1 kV. Using an “in-lens Schottky-emission electron gun” that produces an electron beam with a maximum probe-current of 300 nA, this newly-developed instrument allows for high-resolution observations and fast analyses. For the FIB column, a high-current density Ga ion beam of up to 90 nA maximum probe-current is employed for fast ion milling and processing of specimens.
Concurrent with high-speed cross-section processing by FIB, high-resolution SEM observations and fast analyses can be conducted utilizing energy dispersive X-ray spectroscopy (EDS) and electron backscatter diffraction (EBSD). Additionally, a three-dimensional analysis function that automatically captures SEM images at certain intervals in cross-section processing is provided as one of the JIB-4700F's standard features. This Multi Beam System will be offered to public and private R&D sites and semiconductor manufactures.
- High-resolution SEM observation
Guaranteed resolution of 1.6 nm at a low accelerating voltage of 1 kV is delivered by a magnetic/electrostatic hybrid conical objective lens, GB mode and in-lens detector.
- Fast analysis
Fast analysis is enabled because high resolution can be maintained in analyses under large probe-current by the combination with an in-lens Schottky-emission electron gun and aperture angle control lens.
- High-speed processing
High-power Ga ion beam column enables rapid processing of specimens.
- Enhanced detection system
Simultaneous detection system involving the newly-developed in-lens detectors allows for real-time observation of images from up to 4 detectors.
The JIB-4700F is compatible with a variety of optional attachments including EDS, EBSD, cryo-transfer systems, cooling stages and air-isolated transfer systems, etc.
- Three-dimensional observation/analysis
Three-dimensional visualization of images and analysis data is possible with the combination with high-resolution SEM and appropriate optional analysis unit(s).
- Stage linkage function
With the atmosphere pick-up system (optional) and stage linkage function, TEM (transmission electron microscope) specimens can be retracted with ease.
- Picture overlay system
Overlaying optical microscope images from the atmosphere pick-up system on FIB images makes it easier to identify a FIB processing point.
|Accelerating voltage||0.1 to 30.0 kV|
|1.2 nm (15 kV, GB mode)
1.6 nm (1 kV, GB mode)
|Magnification||x20 to 1,000,000|
|Probe current||1 pA to 300 nA|
|Specimen stage||Computerized 6-axis goniometer stage
X: 50 mm, Y: 50mm, Z: 1.5 to 40 mm, R: 360°, T: -5 to 70°,
FZ: -3.0 to +3.0 mm
|Accelerating voltage||1 to 30 kV|
|Image resolution||4.0 nm (30 kV)|
|Magnification||x50 to 1,000,000
(Magnification of x50 to 90 can be used with an acceleration voltage of less than 15 kV.)
|Probe current||1 pA to 90 nA (in 13 steps)|
|Processing shape by milling||rectangle, line, spot, circle, bitmap|
Annual unit sales target
20 units/year (initial year)
JIB-4700F Multi Beam System
JEOL is a world leader in electron optical equipment and instrumentation for high-end scientific and industrial research and development. Core product groups include electron microscopes (SEMs and TEMs), instruments for the semiconductor industry (electron beam lithography and a series of defect review and inspection tools), and analytical instruments including mass spectrometers, NMRs and ESRs.
For more information about JEOL Ltd. or any JEOL products, visit www.jeol.com.