JEOL commercialized the world's first FE-EPMA, the JXA-8500F in 2003. This highly regarded FE-EPMA has long been used in various fields, such as: metals, materials and geology in both industry and academia. The JXA-8530FPlus is a third-generation FE-EPMA that comes with enhanced analytical and imaging capabilities. The In-Lens Schottky field emission electron gun combined with new software provides higher throughput while maintaining high stability, thus allowing a wider range of EPMA applications to be achieved with higher resolution.

In-Lens Schottky Plus FEG EPMA version

The In-Lens Schottky Plus FEG EPMA version, with an optimized angular current density, allows for analysis with a large probe current of 2μA or more. The resolution of secondary electron image has been improved even under analytical conditions by automatically adjusting for the correct convergence angle.

Advanced software

A wealth of Microsoft Windows®-based advanced applications systems are available, including:
1) Trace Element Analysis Program for simpler, optimized analysis of trace elements including adding data collected from up to 5 spectrometers,
2) Phase Map Maker for automatic creation of phase maps based on principal components,
3) Non-Flat Surface Analysis Program for automated WDS analysis of specimens with surface irregularities. This is possible due to the large Z travel of the stage (7.5 mm).

Notices:Windows is a registered trademark of Microsoft Corporation in the United States and other countries.

Flexible WDS configuration

Various X-ray spectrometers (WDSs) can be selected: a Rowland circle radius of 140 mm (140R) or 100 mm (100R), 2 crystal or 4 crystal configurations and a mix of standard or large size crystals.
The XCE (2 xtl) X-ray Spectrometer, the FCS (4 xtl) X-ray spectrometer and the L (large 2 xtl) X-ray Spectrometer for 140R have wide spectrometry range and provide superior wavelength resolution and peak-to-background ratio. The H Type X-ray Spectrometer of 100R provides high X-ray intensity. Users can select from these spectrometers depending on requirements.

Combined WDS/EDS system

The JXA-8530FPlus comes with JEOL's 30mm2 silicon-drift detector (SDD).
A high count-rate SDD along with an in-situ variable aperture enables EDS analysis at WDS conditions. EDS spectra, maps and line scans can be acquired simultaneously with WDS data.

Multipurpose chamber

The JXA-8530FPlus is equipped with a highly-expandable specimen chamber and specimen exchange chamber, enabling you to integrate a variety of optional attachments on the chamber.

These include:

  • Electron Backscatter Diffraction System (EBSD)
  • Tilting rotating sub-stage
  • Cathodoluminescence Detectors (panchromatic, monochromatic, full color hyperspectral)
  • Soft X-ray Emission Spectrometer
  • Air Isolated Transfer Vessel
  • High Etching Rate Ion Source, in-situ cleaner, etc.
Multi purpose chamber

Powerful clean vacuum system

A powerful, clean vacuum system is employed on the JXA-8530FPlus, including two magnetic-levitation turbo molecular pumps. In addition, a two-stage intermediate chamber is provided for the electron optical column, thus maintaining high vacuum in the electron-gun chamber by differential pumping.
The addition of optional Scroll pumps and a liquid nitrogen cold finger create the ultimate oil free vacuum system.

Soft X-ray Emission Spectrometer (SXES)

Soft X-ray Emission Spectrometer(SXES)
An ultra-high energy-resolution Soft X-ray Emission Spectrometer was co-developed by the Institute of Multidisciplinary Research for Advanced Materials, Tohoku University (Prof. M. Terauchi) and JEOL Ltd., etc.
The variable-line-spacing (VLS) grating enables simultaneous detection (much like EDS) and allows detection of Li-K and B-K spectra with a high-sensitivity CCD. This spectrometer achieves superbly high energy-resolution, enabling detailed chemical-bonding state analysis.
高分解能X線分光器

miXcroscopy (Correlative microscope)

miXcroscopy Linked Optical & Scanning Electron Microscopy System
Regions of interest, along with X-Y stage coordinates, located in the optical microscope can be recorded and transferred to the EPMA for navigation to the desired location for imaging and analysis. 

Specifications

Elemental analysis range WDS: (Be) B to U, EDS: B to U
X-ray spectrometry range WDS spectrometry range: 0.087 to 9.3 nm
EDS energy range: 20 keV
Number of X-ray spectrometers WDS: 1 to 5 selectable, EDS: 1
Maximum specimen size 100 mm × 100 mm × 50 mm (H)
Accelerating voltage 1 to 30 kV (0.1 kV step)
Probe current stability ± 0.3%/h
Secondary electron image resolution 3 nm at WD 11 mm, 30 kV
20 nm at 10 kV, 10 nA, WD 11 mm
50 nm at 10 kV, 100 nA, WD 11 mm
Magnification x40 to x300,000 (WD 11mm)
Scanning image pixel resolution Up to 5,120 x 3,840

Installation Examples

Introduction to JEOL Products

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