X-ray photoelectron spectroscopy (XPS) is widely used for elemental analysis and chemical state analysis on the surface of metal, polymer, and semiconductor materials. Since XPS uses X-rays as an excitation source, samples are free from charge accumulation and are subject to a minimum of damage. This is one of the advantages over other surface analyzers. A new computer system for XPS has been developed to further enhance its performance. An outline of this new system is as follows.
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