Release of the JIB-4700F, a New Multi Beam System (Focused Ion Beam-Scanning Electron Microscope (FIB-SEM)) – High Resolution, High Throughput System for Nano Milling and Analysis –


JEOL Ltd. (President Gon-emon Kurihara) announces the release of the JIB-4700F Multi Beam System, a newly-developed FIB-SEM instrument to be distributed in January 5, 2017. 

Product development background

Advances in the development of new materials featuring complex nanostructures places increased demands on FIB-SEM instruments for exceptional resolution, accuracy and throughput. In response, JEOL has developed the JIB-4700F Multi Beam System, a new processing and observation system to be used in morphological observations, elemental and crystallographic analyses of a variety of specimens.  

The JIB-4700F features a hybrid conical objective lens, GENTLEBEAM™ (GB mode) and an in-lens detector system to deliver a guaranteed resolution of 1.6 nm at a low accelerating voltage of 1 kV. Using an “in-lens Schottky-emission electron gun” that produces an electron beam with a maximum probe-current of 300 nA, this newly-developed instrument allows for high-resolution observations and fast analyses. For the FIB column, a high-current density Ga ion beam of up to 90 nA maximum probe-current is employed for fast ion milling and processing of specimens.

Concurrent with high-speed cross-section processing by FIB, high-resolution SEM observations and fast analyses can be conducted utilizing energy dispersive X-ray spectroscopy (EDS) and electron backscatter diffraction (EBSD). Additionally, a three-dimensional analysis function that automatically captures SEM images at certain intervals in cross-section processing is provided as one of the JIB-4700F's standard features. This Multi Beam System will be offered to public and private R&D sites and semiconductor manufactures.

Main Features

  1. High-resolution SEM observation
    Guaranteed resolution of 1.6 nm at a low accelerating voltage of 1 kV is delivered by a magnetic/electrostatic hybrid conical objective lens, GB mode and in-lens detector.
  2. Fast analysis
    Fast analysis is enabled because high resolution can be maintained in analyses under large probe-current by the combination with an in-lens Schottky-emission electron gun and aperture angle control lens.
  3. High-speed processing
    High-power Ga ion beam column enables rapid processing of specimens.
  4. Enhanced detection system
    Simultaneous detection system involving the newly-developed in-lens detectors allows for real-time observation of images from up to 4 detectors.
  5. Versatility
    The JIB-4700F is compatible with a variety of optional attachments including EDS, EBSD, cryo-transfer systems, cooling stages and air-isolated transfer systems, etc.
  6. Three-dimensional observation/analysis
    Three-dimensional visualization of images and analysis data is possible with the combination with high-resolution SEM and appropriate optional analysis unit(s).
  7. Stage linkage function
    With the atmosphere pick-up system (optional) and stage linkage function, TEM (transmission electron microscope) specimens can be retracted with ease.
  8. Picture overlay system
    Overlaying optical microscope images from the atmosphere pick-up system on FIB images makes it easier to identify a FIB processing point.

Main Specifications

Accelerating voltage  0.1 to 30.0 kV 
Image resolution
(optimal WD)
1.2 nm (15 kV, GB mode)
1.6 nm (1 kV, GB mode)
Magnification x20 to 1,000,000
Probe current  1 pA to 300 nA 
Specimen stage Computerized 6-axis goniometer stage
X: 50 mm, Y: 50mm, Z: 1.5 to 40 mm, R: 360°, T: -5 to 70°,
FZ: -3.0 to +3.0 mm
Accelerating voltage 1 to 30 kV 
Image resolution 4.0 nm (30 kV)
Magnification x50 to 1,000,000
(Magnification of x50 to 90 can be used with an acceleration voltage of less than 15 kV.)
Probe current 1 pA to 90 nA (in 13 steps) 
Processing shape by milling rectangle, line, spot, circle, bitmap 

Annual unit sales target

20 units/year (initial year)