Release of a New Focused Ion Beam Milling & Imaging System JIB-4000PLUS –High throughput FIB with automatic functions and large beam current of 90 nA–


JEOL Ltd. (President Gon-emon Kurihara) announces the release of a new focused ion beam milling & imaging system, JIB-4000PLUS, to be released in January 2019.

Product development background

In the nano-scale materials structure control, as well as the development and fabrication of power semiconductor devices and CMOS sensors, it is essential to implement morphological observation and configuration management of these materials and devices. The scanning electron microscope (SEM), transmission electron microscope (TEM) and scanning transmission electron microscope (STEM) have been widely used for various observations. Now the demands for the focused ion beam (FIB) system that performs pre-treatment of specimens for smooth observation are increasingly accelerating. In addition, the users request increased efficiency, shortened time and reduced costs for the pre-treatment and preparation of the specimens.
To meet these requests, JEOL has developed a new system, JIB-4000PLUS featuring automation and high-speed processing.
A newly-developed automatic specimen preparation function "STEMPLING" allows for automatic unattended operations of sequential multi-specimen preparations for SEM, TEM, STEM observations. Also, the maximum ion beam current can be increased up to 90 nA, thus achieving shorter processing time than JEOL conventional FIB systems.
To this end, the JIB-4000PLUS, a next-generation focused ion beam milling & imaging system, meets diversified needs of the industry and academia users.

Main Features

  • Automatic TEM specimen preparation function
    The JIB-4000PLUS can use an optional "STEMPLING," an automatic TEM specimen preparation function. This new function enables anyone to easily prepare specimens. Since the function also enables automatic preparations of multiple specimens, unattended operation overnight can be made for preparing large amounts of specimens. These features lead to a dramatically improved throughput.
  • High Power FIB column
    The JIB-4000PLUS incorporates a High Power FIB column with a maximum ion beam current of 60 nA. Furthermore, the system can increase a beam current up to 90 nA (optional), thus achieving a shortened specimen preparation time and a larger-area specimen preparation.
  • 3D observation function
    The JIB-4000PLUS comes with a function of serially-sliced cross section imaging for 3D observation. Although the JIB-4000PLUS is a single-beam FIB system, 3D observation can be made using SIM image. The optional 3D reconstruction software enables the 3D reconstruction of the acquired multiple cross sectional images, allowing for displaying the 3D image at various angles.
  • A wealth of attachments
    The JIB-4000PLUS accommodates a variety of attachments available to support the operations of the system. The attachments include the side-entry goniometer stage for allowing direct loading of the TEM specimen holder, the CAD navigation system useful for circuit modifications, the vector scan system effective to mill a specimen with characteristic shapes, and additional gas injection systems. By adding the appropriate attachments to the JIB-4000PLUS, the system can support applications beyond specimen preparation.

Main Specifications

Ion source Ga liquid metal ion source
Accelerating voltage 1 to 30 kV
Magnification ×60 (for searching a field), ×200 to ×300,000
Image resolution 5 nm (at 30 kV)
Maximum beam current 60 nA (at 30 kV): standard, 90 nA (at 30 kV): optional
Movable aperture 12 steps (motor drive)
Processing shapes by milling Rectangle, Line, Spot, Circle,
Bitmap (arbitrary shape by image file): optional,
Vector scan: optional
Specimen stage
Specimen stage Bulk-specimen 5 axis goniometer stage
Movement range X:±11 mm
Y:±15 mm
Z: 0.5 to –23 mm
T: –5 to +60°
R: 360°
Maximum specimen size Outer diameter 28 mm (height 13 mm)
Outer diameter 50 mm (height 2 mm)


Annual unit sales target

20 units/year