- Related Products
Innovative Specimen Preparation Method for TEM / STEM / SEM / EPMA / AUGER
The Ion Slicer can prepare thin-film specimens without solvents or chemicals and requires no prior treatment of the specimen other than rectangular slicing (no disc grinding or dimple grinding).
The Ion Slicer prepares thin-film specimens faster and easier than conventional preparation tools. A low-energy, low-angle Ar ion beam irradiates the specimen while a thin shield belt allows low-angle irradiation of the Ar ion beam (from 0° to 6°), drastically reducing ion-beam irradiation damage to the specimen. The result is a high-quality thin film with few sputtering artifacts--even in soft materials. The Ion Slicer can efficiently prepare thin films from specimens having different compositions, even those having porous composites.
- High quality TEM pre-treatment
- Fast preparation
- No complicated pre-treatments
- Minimal surface damage
|Ion accelerating voltage||1 to 8kV|
|Tilt angle||Up to 6°(0.1°step)|
|Milling rate||5m/min (8 kV, silicon)|
|Gas for beam irradiation||Argon|
|Recommended specimen size||2.8mm (in length)0.5 mm (in width) 0.1mm (in thickness)|
|Pressure measurement||Penning gauge|
|Main evacuation system||Turbo-molecular pump|
|Dimension and weight||Main console||500mm(W)×600mm(D)×542mm(H)、63kg|
|Power||Single phase, AC100 to 120V, 50/60Hz, 500 to 600VA|
|Grounding terminal||100 ohms or less|
|Argon gas||Pressure: 0.15±0.05MPa(1.0 ∼ 2.0kg/cm2)
Argon gas flow rate: About 0.2 ccm
Purity: 99.9999% or more
Hose joint: JIS B0203 Rc 1/8
*Argon gas (including piping and gas container) and a regulator should be provided by customer.
|Temperature||20 to 25℃(fluctuation: 1°C/hor less)|
|Humidity||60% or less|
※Please provide a table for mounting the equipment.
※Specifications subject to change without prior notice.