JSM-IT510 InTouchScope™ Scanning Electron Microscope

  • Features
  • Specifications
  • Application
  • Gallery
  • Related Products
  • Information

Features

JSM-IT510 InTouchScope™ Scanning Electron Microscope

Easy to acquire data for all specimen types

Scanning electron microscopes (SEMs) are indispensable tools not only for research but also for quality assurance and manufacturing sites.
At those scenes, the same observation processes need to be performed repeatedly and there has been a need to improve the efficiency of the process.

With the JSM-IT510, the newly added Simple SEM function allows users to "leave the manual repetitive operation to it", required for SEM observation, making SEM observation more efficient and easier.

Simple SEM

Just select the target field

Simple SEM supports daily routine work.

  • Specimen: Electronic device
  • Accelerating voltage: 15 kV, (Top) Magnification: ×50 (Bottom) ×1,000, Signal: BE
Simple SEM / JSM-IT510

Video introducing the JSM-IT510

Functions of Simple SEM are introduced.

◆Clicking the Play button starts the video (approx. 2 minutes).

Specimen Exchange Navi

Guide from specimen exchange to automatic observation

Safe and simple! Specimen Exchange Navi

  • Follow the Navi guide to set specimen
    Specimen Exchange Navi / JSM-IT510
  • Prepare for observation during evacuation
    Specimen Exchange Navi / JSM-IT510

    *1 Stage Navigation System (SNS) is an option.
    *2 SNS Large Sample (SNSLS) is an option. Compatible with SNS.
    *3 Chamber Scope (CS) is an option.

  • Start observation automatically
    Automatic image formation after evacuation.
    Specimen Exchange Navi / JSM-IT510

Zeromag

Magnify the optical image *1, transition to SEM image

The Zeromag function simplifies navigation providing a seamless transition from the optical to SEM image.
The SEM, optical image and holder graphic are all linked for a global view of analysis locations.
*1 Stage Navigation System (SNS) is needed to display the optical image.

Zeromag / JSM-IT510
  • Specimen: Fossil of ammonite
  • Accelerating voltage: 7 kV, Signal: BE

Live Analysis / Live Map*2

Embedded EDS for Real-Time elemental composition during observation

Live Analysis is a function which displays the EDS spectrum or element maps in Real-Time during image observation. This function can support searching and provide an alert for target elements.
* Live Analysis is a standard for A (Analysis) / LA (Low Vacuum & Analysis).

  • Specimen: Fossil of ammonite
  • Accelerating voltage: 15 kV,　Magnification: ×1,000
Live Analysis / JSM-IT510

Simple analysis

The EDS analysis can be started within 3 clicks.

Live Analysis Simple analysis / JSM-IT510

Video introducing the JSM-IT510

Functions of Live Map are introduced.

◆Clicking the Play button starts the video (approx. 2 minutes).

Variety of advanced options

Low-vacuum Hybrid Secondary Electron Detector (LHSED)*

This new detector collects both electron and photon signals providing an image with high S/N and enhanced topographic information.
* LHSED is an option. And LV (Low Vacuum) or L A (Low Vacuum & Analysis) is also required.

Low-vacuum Hybrid Secondary Electron Detector (LHSED) / JSM-IT510

The mechanism of LHSED

  • Specimen: Plaster
  • Accelerating voltage: 7 kV, Magnification: x10,000, Signal: LV SE

Live 3D *

The images obtained by a new quadrant BE detector* can be displayed as a live 3D image.
3D images can clearly represent the shape of a specimen, even for those with subtle topographic information.
* Live 3D is a standard in LV (Low Vacuum), LA (Low Vacuum & Analysis). BE detector (option) can be equipped on BU (Base Unit), A (Analysis).　

Simple SEM / JSM-IT510
  • Specimen: Screw
  • Accelerating voltage: 15 kV Magnification: x100 Signal: BE

Montage

Montage function automates large area image collection and stitching of these images into a composite image.

Montage / JSM-IT510
  • Specimen: Fossil of ammonite
  • Accelerating voltage: 15 kV, Magnification: x150, Signal: BE, Number of field: 13 x 13
* Stage Navigation System (SNS) is needed to display the optical image.

Display the depth of signal

This function displays the analysis depth (approx.) in the specimen.
For element analysis, it is very useful.

Display the depth of signal / JSM-IT510

Link

Catalogue Download

Catalogue Download
You can download each catalogue of JEOL products, in the pdf format.

Specifications

Technical DATA

JSM-IT510 series can be equipped in the following 4 configurations: BU (Base Unit) / A (Analysis) / LV (Low Vacuum) / LA (Low Vacuum & Analysis).

BU (Base Unit)

Basic type for observation under high vacuum

A (Analysis)

Analysis type, EDS is attached on BU as a standard

LV (Low Vacuum)

Low Vacuum type, for high and low vacuum operation. BED included.

LA (Low Vacuum & Analysis)

Low vacuum type, for high and low vacuum operation, BED and EDS included.

SEM specifications

Resolution
  • High vacuum mode　
  • 3.0 nm (30 kV), 15.0 nm (1.0 kV)
  • Low vacuum mode*1　
  • 4.0 nm (30 kV BED)

Photo magnification
  • ×5 to ×300,000 
    (Defined with a photo size of 128 mm × 96 mm)

Display magnification
  • ×14 to ×839,724
    (Defined with a photo size of 358 mm × 296 mm)

Electron gun
  • W filament, fully automatic gun alignment

Accelerating voltage
  • 0.3 kV to 30 kV

LV pressure
adjustment*1
  • 10 to 650 Pa

Objective lens aperture
  • Four stage, with XY fine adjustment function

Automatic function
  • Filament adjustment, Gun alignment adjustment
  • Beam alignment
  • Focus/ Astigmatism / Brightness / Contrast correction

Maximum specimen
size
  • 200 mm diameter × 75 mm height
  • 200 mm diameter × 80 mm height*3
  • 32 mm diameter × 90 mm height*3

Specimen stage
  • Large eucentric stage
  • X：125 mm　Y：100 mm　Z：80 mm
  • tilt: -10 to 90° rotation: 360°

Image mode
  • Secondary electron image, REF image, Compositional image* 1
  • Topographic image*1, Shadow image*1、PD image*4

Image size
  • 640 × 480　1,280 × 960
  • 2,560 × 1,920　5,120 × 3,840

Photo assist function
  • Montage, Simple SEM, Zeromag, Live 3D

Operation support
function
  • Recipe (Standard recipe / Custom recipe)
  • Measurement (distance between 2 points, distance between parallel lines, angle, diameter etc.)
  • Specimen exchange navi
  • Signal depth function
  • 3D measurement*5

OS
  • Microsoft® Windows®10 64bit

Observation monitor
  • 23.8 inch touch panel

EDS functions*2
  • Refer to EDS specification

Data management
  • SMILE VIEW™ Lab

Report generation
One-click report
  • Output to Microsoft®Word
  • Output to Microsoft®PowerPoint*6

Language switch
  • Japanese, English, Chinese*7 (operable on UI)

Vacuum system
  • Full automatic, TMP: 1, RP: 1 or 2*1

Main options

  • Backscattered Electron Detector (BED)*1
  • Low Vacuum Hybird Secondary Electron Detector (LHSED)
  • Low Vacuum Secondary Electron Detector (LVSED)
  • Energy Dispersive X-ray Spectrometer (EDS)*2
  • Wavelength Dispersive X-ray Spectrometer (WDS)
  • Electron Backscatter Diffraction Pattern (EBSD)
  • Load Lock Chamber (pre-evacuation chamber)
  • Stage Navigation System (SNS)
  • Stage Navigation System Large Sample (SNSLS)
  • Chamber Scope (CS)
  • Operation Panel (OP2)
  • LaB6Electron Gun (LAB6)
  • 3D Analysis Software (SVM)
  • Table (TBL)

EDS specifications

Applicable to A (Analysis) / LA (Low Vacuum & Analysis)
●：Standard　○：Option

Standard

Control PC

OS：Microsoft®Windows®10 64bit*8

●

Language

Japanese / English / Chinese*7

●

Detector

SDD type

Select from the
detector list

Spectral analysis
  • Qualitative analysis (peak identification, automatic qualitative analysis)
  • Visual peak ID
  • Standard-less quantitative analysis (ZAF method)
  • Standard quantitative analysis (ZAF method)*9
  • PHI-RHO-Z (PRZ) method: quantitative correction method
  • QBase (Qualitative analysis database)

●

Line analysis

Line analysis (parallel & arbitrary direction)

●

Elemental map
  • Elemental map (map with multiple colors, monochrome, multiple-color superimposition)
  • Maximum pixel resolution: 4,096 × 3,072
  • Real-time pop-up spectrum
  • Deconvolution map (net count map, quantitative map)
  • Real-time net count map
  • Real-time filter
  • Line profile display
  • Probe tracking
  • Playback analysis (time resolved spectral map)

●

Serial analysis
  • Spectral analysis, Line analysis, Elemental map
  • Comprehensive analysis of already-analyzed data (qualitative & quantitative analysis)

●

Montage
  • Automatic montage (SEM image, Elemental map)
  • Serial elemental mapping for multiple areas

●

Particle analysis software
  • Particle analysis (auto / manual) & EDS analysis,
    Classification of particle analysis data,
    Graph display of statistical processed particle analysis data,
    Large-area serial particle analysis
  • GSR (Gun Shot Residue) library
  • Metal feature analysis library
  • Automobile parts cleanliness analysis library
  • ○


     
  • ○
  • ○
  • ○

Report generation

SMILE VIEW™ Lab
Output as Microsoft®Word, Microsoft®PowerPoint file*6

●

SEM integration
  • Integrated management of observation & analysis data
  • Specifying analysis position on the SEM operation screen (Direct analysis on UI for SEM)
  • Graphical display of analysis positions

●

Help function

Help guide

●

Dual detector

Analysis with two detectors*10

○

Off-line function

License software for off-line data analysis

○
  • *1 Standard in JSM-IT510LV / LA.
  • *2 Standard in JSM-IT510A / LA.
  • *3 An optional holder is required.
  • *4 LHSED (option) is required.
  • *5 SVM (option) is required.
  • *6 Microsoft® Offce must be installed.
  • *7 Chinese is optional.
  • *8 For JSM-IT510A / LA, EDS software is installed on the same PC as SEM control software.
  • *9 The optional probe current compensation unit (option) is required. Automatic monitoring of the probe current is possible only when EDS is connected to the microscope PC.
  • *10 Two EDS detectors with the same active sensor size are required. There is a limitation for stage movements depending on installation ports.
  • Specifications subject to change without notice.
  • Microsoft, Windows, PowerPoint and Microsoft Office are registered trademarks of Microsoft Corporation in USA and other countries.
  • Microsoft Word is a product name of Microsoft Corporation.



 

Application

Gallery

Metal

Crystalline observation of steel

For crystalline materials, such as metals, the contrast (channeling contrast) caused by the difference in crystal orientation can be imaged.

Crystalline observation of steel / JSM-IT510
Specimen: Cross section of high-tension steel,　Accelerating voltage: 5 kV,　Magnification: x500,　Signal: BE
IB-19530CP / JSM-IT510
 

CROSS SECTION POLISHER™ IB-19530CP *1


CROSS SECTION POLISHER™ (CP) is designed for producing cross section or surface milling by using a broad Ar ion beam to irradiate the specimen.
Compared with mechanical milling, CP can easily produce a fine cross section without distortion.
*1 Sold separately.

Fracture surface observation

Fracture surface observation by SEM is widely used to study the causes of failure and crack growth.


Striations produced by fatigue fracture
Striations produced by fatigue fracture
Specimen: Austenitic stainless steel, Accelerating voltage: 10 kV,　Magnification: x5,000,　Signal: SE

Dimples produced by ductile fracture
Dimples produced by ductile fracture
Specimen: Austenitic stainless steel,　Accelerating voltage: 10 kV,　Magnification: x5,000,　Signal: SE
Rock candy pattern produced by intergranular fracture
Rock candy pattern produced by intergranular fracture
Specimen: Austenitic stainless steel,　Accelerating voltage: 10 kV,　Magnification: x5,000,　Signal: SE

Semiconductor

Resist pattern observation

In semiconductor fabrication, quality management of resist by SEM is very important.
The process can be confirmed by imaging the cross section of the resist pattern. Measuring line width is also possible.

Cross section of resist pattern (tilt to 35°)
Cross section of resist pattern (tilt to 35°)
Accelerating voltage: 8 kV,　Magnification: x30,000,　Signal: SE

Resist pattern written on a Si wafer

Resist pattern written on a Si wafer
Accelerating voltage: 10 kV,　Magnification: x3,000,　Signal: SE
Resist pattern written on a Si wafer
Accelerating voltage: 10 kV,　Magnification: x20,000,　Signal: SE

Printed circuit board (PCB) inspection

SEM is an effective instrument in quality management of PCB.
The low vacuum condition enables direct observation of the PCB without pre-treatment.

Chip condenser on the PCB
Chip condenser on the PCB
Accelerating voltage: 15 kV,　Magnification: x45,　Signal: Mixed signal
(LV backscattered electron: LV secondary electron = 3:7)
Image analysis software* allows measuring line width automatically.
Image analysis software
* Option. MultiImageTool (produced by SYSTEM IN FRONTIER INC.)

Soft material / Polymer

JSM-IT510 under low vacuum condition is suitable for direct observation of non-conductive specimens, such as superabsorbent polymer and mask.

Superabsorbent polymer

Superabsorbent polymer
Accelerating voltage: 10 kV,　Magnification: x1,000,　Signal: LV SE
Superabsorbent polymer
Accelerating voltage: 10 kV,　Magnification: x1,000,　Signal: LV BE
Non-woven mask
Non-woven mask
Accelerating voltage: 10 kV,　Magnification: x50,　Signal: LV BE
Urethane mask
Urethane mask
Accelerating voltage: 10 kV,　Magnification: x50,　Signal: LV BE

It is possible to obtain SE image and BE image simultaneously.
The SE image provides shape information.
The BE image shows bright areas indicating higher atomic number composition for this area.

Biology

The normal shape of biological specimen, such as cells or microorganisms, can be confirmed after pre-treating them by chemical fixation or freeze drying method to keep their shape.

Erythrocyte and leukocyte
Erythrocyte and leukocyte
Accelerating voltage: 3 kV,　Magnification: x7,000,　Signal: SE
Chlorella
Chlorella
Accelerating voltage: 3 kV,　Magnification: x15,000,　Signal: SE
Daphne pollen
Daphne pollen
Accelerating voltage: 10 kV,　Magnification: x2,000,　Signal: SE

Related Products

Information

Installation Examples

Print
INQUIRY FORM
SERVICE
Discontinued Products
Glossary of TEM Terms
Glossary of SEM Terms