- Electron Probe Microanalyzer (EPMA)
- JXA-8530FPlus Field Emission Electron Probe Microanalyzer
JXA-8530FPlus Field Emission Electron Probe Microanalyzer
- Related Products
In-Lens Schottky Plus FEG EPMA version
The In-Lens Schottky Plus FEG EPMA version, with an optimized angular current density, allows for analysis with a large probe current of 2μA or more. The resolution of secondary electron image has been improved even under analytical conditions by automatically adjusting for the correct convergence angle.
A wealth of Microsoft Windows®-based advanced applications systems are available, including:
- Trace Element Analysis Program for simpler, optimized analysis of trace elements including adding data collected from up to 5 spectrometers,
- Phase Map Maker for automatic creation of phase maps based on principal components,
- Non-Flat Surface Analysis Program for automated WDS analysis of specimens with surface irregularities. This is possible due to the large Z travel of the stage (7.5 mm).
Notices:Windows is a registered trademark of Microsoft Corporation in the United States and other countries.
Flexible WDS configuration
Various X-ray spectrometers (WDSs) can be selected: a Rowland circle radius of 140 mm (140R) or 100 mm (100R), 2 crystal or 4 crystal configurations and a mix of standard or large size crystals.
The XCE (2 xtl) X-ray Spectrometer, the FCS (4 xtl) X-ray spectrometer and the L (large 2 xtl) X-ray Spectrometer for 140R have wide spectrometry range and provide superior wavelength resolution and peak-to-background ratio. The H Type X-ray Spectrometer of 100R provides high X-ray intensity. Users can select from these spectrometers depending on requirements.
Combined WDS/EDS system
The JXA-8530FPlus comes with JEOL's 30mm2 silicon-drift detector (SDD).
A high count-rate SDD along with an in-situ variable aperture enables EDS analysis at WDS conditions. EDS spectra, maps and line scans can be acquired simultaneously with WDS data.
The JXA-8530FPlus is equipped with a highly-expandable specimen chamber and specimen exchange chamber, enabling you to integrate a variety of optional attachments on the chamber.
- Electron Backscatter Diffraction System (EBSD)
- Tilting rotating sub-stage
- Cathodoluminescence Detectors (panchromatic, monochromatic, full color hyperspectral)
- Soft X-ray Emission Spectrometer
- Air Isolated Transfer Vessel
- High Etching Rate Ion Source, in-situ cleaner, etc.
Powerful clean vacuum system
A powerful, clean vacuum system is employed on the JXA-8530FPlus, including two magnetic-levitation turbo molecular pumps. In addition, a two-stage intermediate chamber is provided for the electron optical column, thus maintaining high vacuum in the electron-gun chamber by differential pumping.
The addition of optional Scroll pumps and a liquid nitrogen cold finger create the ultimate oil free vacuum system.
Soft X-ray Emission Spectrometer (SXES)
Soft X-ray Emission Spectrometer(SXES)
An ultra-high energy-resolution Soft X-ray Emission Spectrometer was co-developed by the Institute of Multidisciplinary Research for Advanced Materials, Tohoku University (Prof. M. Terauchi) and JEOL Ltd., etc.
The variable-line-spacing (VLS) grating enables simultaneous detection (much like EDS) and allows detection of Li-K and B-K spectra with a high-sensitivity CCD. This spectrometer achieves superbly high energy-resolution, enabling detailed chemical-bonding state analysis.
miXcroscopy (Correlative microscope)
miXcroscopy Linked Optical & Scanning Electron Microscopy System
Regions of interest, along with X-Y stage coordinates, located in the optical microscope can be recorded and transferred to the EPMA for navigation to the desired location for imaging and analysis.
|Elemental analysis range||WDS: (Be) B to U, EDS: B to U|
|X-ray spectrometry range||WDS spectrometry range: 0.087 to 9.3 nm
EDS energy range: 20 keV
|Number of X-ray spectrometers||WDS: 1 to 5 selectable, EDS: 1|
|Maximum specimen size||100 mm × 100 mm × 50 mm (H)|
|Accelerating voltage||1 to 30 kV (0.1 kV step)|
|Probe current stability||± 0.3%/h|
|Secondary electron image resolution||3 nm at WD 11 mm, 30 kV|
|20 nm at 10 kV, 10 nA, WD 11 mm
50 nm at 10 kV, 100 nA, WD 11 mm
|Magnification||ｘ40 to ｘ300,000 (WD 11mm)|
|Scanning image pixel resolution||Up to 5,120 ｘ 3,840|