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特長

  • Lightning-fast speeds:
    EDM systems achieve switching times faster than 20 ns.

  • Independent intensity adjustment:
    By rapidly turning the beam on and off with variable pulse widths, the EDM makes it easy to adjust the average beam intensity without changing the image conditions. A desktop accessory knob provides an intuitive interface to adjust the dose attenuation factor.

  • Dose structuring:
    Users can take control of their illumination by applying dose in pulses with variable durations as short as 100 ns and frequencies up to 500 kHz.

  • Modern control software:
    The EDM works out of the box as a fast beam blanker. Control software is included for programmable dose attenuation, logging, and more.

  • Integration:
    The EDM act as a fast reliable pre-sample beam blanker while supporting a companion Relativity Sub-Framing System as well as third-party hardware.

Pulsed beam TEM illumination*

Pulsed beam STEM Illumination*

Dose attenuation by pulsed illumination with Frequency of 500 kHz (2 μs) in a high resolution STEM at 300 kV using Si[110] in the condition of pixel dwell time with 19 μs/pixel (1,024 x 1,024 pixels), by changing duration ration from 90% to 50% during acquisition of one STEM image in 20 s.

仕様・オプション

Fast beam blanking

Quantity Value
Maximum pulse frequency 500 kHz
Transition time 90%-10% < 20 ns
Blanking signals 3 inputs

Dose attenuation

Configuration EDM Basic
Application TEM and STEM imaging
Pulse repetition frequency (max) 500 kHz
Pulse width increment 62.5 ns
Minimum pulse width 125 ns

EDM option

EDS True Area Scan EDM Programmable Scan with EDM Synchrony
 

Applicable model: JEM-ARM300F2, JEM-ARM200F (CFEG), NEOARM (CFEG), JEM-F200 (CFEG), JEM-2200FS*, JEM-2100F*, JEM-3300, JEM-Z200FSC, JEM-Z200CA

(* These models should be equipped with a standard column without the Cs corrector.)

ギャラリー

◆Click the "replay" button in the box above, and the movie will start (2.5 min.)◆

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