- Related Products
High-power electron beam sources for vacuum evaporation of metals and metal-oxides to a wide plastic film or a large glass plate that are continuously fed. And also used for vacuum melting of high-melting point metals.
Electron beam can be swept a wide area at high speed. Various beam irradiation patterns and areas can be created by dedicated control device and software. Sweeping, dwell time, output power and beam shape at each irradiation position can be set up individually, thus can control melting surface and film thickness distribution.
Gas barrier films, protective films, electrode films, conductive films,
magnetic storage films.
Refinement/Ingot production of high-melting-point metals such as
Ti, Ta, Nb and Mo.
Polycrystalline silicon refining for solar cell.
|Beam deflection angle||Max. ±30°|
|Sweeping direction||X, Y axis|
|Corresponding power supply||ST-30BE2||JST-100C||JST-300CHR|