• Features
  • Specifications
  • Application
  • Related Products
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Features

JEBG series High-power electron beam sources
High-power electron beam sources for vacuum evaporation of metals and metal-oxides to a wide plastic film or a large glass plate that are continuously fed. And also used for vacuum melting of high-melting point metals.

Electron beam can be swept a wide area at high speed. Various beam irradiation patterns and areas can be created by dedicated control device and software. Sweeping, dwell time, output power and beam shape at each irradiation position can be set up individually, thus can control melting surface and film thickness distribution.

Applications

  • Vacuum deposition
    Gas barrier films, protective films, electrode films, conductive films,
    magnetic storage films.
  • Vacuum melting
    Refinement/Ingot production of high-melting-point metals such as
    Ti, Ta, Nb and Mo.
    Polycrystalline silicon refining for solar cell.

Specifications

Model EBG-300UA JEBG-1000UB JEBG-3000UB
 Maximum output
30kW
(20kV, 1.5A)
100kW
(30kV, 3.4A)
300kW
(40kV, 7.5A)
 Beam deflection angle Max. ±30°
 Sweeping direction X, Y axis
Maximum sweeping 
 frequency
300Hz 200Hz
200Hz
(300Hz: Option)
Corresponding power supply ST-30BE2 JST-100C JST-300CHR

Gallery

Related Products

Information

Installation Examples